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“Investigation of plasma parameters formed on the surface of p-type and n-type silicon”

A scientific seminar was held by Matkarimova Shoira Umidbekovna, a doctoral researcher of the Department of Electrical Engineering and Power Engineering at the Faculty of Engineering, on the topic “Investigation of plasma parameters formed on the surface of p-type and n-type silicon.” The relevance of the research is determined by the need to address applied problems in semiconductor technologies, including laser-assisted surface modification, surface cleaning, formation of fine structures, and enhancement of the efficiency of solar cells. The scientific significance of the study lies in identifying differences in plasma parameters formed on p-type and n-type silicon surfaces, which enables the achievement of novel scientific results.

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